Tetramethylammonium hydroxide solution (25 wt. % solution in methanol) may be used in the synthesis of zirconium oxides via a modified sol-gel method with potential as catalyst materials in CO hydrogenation.

Application

T 1476 (OTTO) Tetramethylammonium hydroxide 25% in methanol - used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist.